Coping with technostress in the software industry: Coping strategies and factors underlying their selection

Approved

Classifications

MinEdu publication type
A1 Journal article (peer-reviewed)
Definition
Article
Target group
Scientific
Peer reviewed
Peer-reviewed
Article type
Journal article
Host publication type
Journal

Authors of the publication

Number of authors
5
Authors
Siitonen, Valtteri; Ritonummi, Saima; Salo, Markus; Pirkkalainen, Henri; Mauno, Saija

Publication channel information

Title of journal/series
Journal of systems and software
ISSN (print)
0164-1212
ISSN (electronic)
1873-1228
ISSN (linking)
0164-1212
Publisher
Elsevier
Publication forum ID
61771
Publication forum level
3
Internationality
Yes

Detailed publication information

Publication year
2025
Reporting year
2025
Journal/series volume number
225
Article number
112341
DOI
10.1016/j.jss.2025.112341
Language of publication
English

Co-publication information

International co-publication
No
Co-publication with a company
No

Availability

Classification and additional information

MinEdu field of science classification
113 Computer and information sciences
Keywords
Technostress; Coping; Coping strategy; Software industry; Software development; Software engineering

Funding information

Funding information in the publication
This work was supported by the Finnish Foundation for Economic Education; the Research Council of Finland [grant number 341359, 346479]; the Emil Aaltonen Foundation.

Research data information

Research data information in the publication
In the privacy notice of the study, the respondents were promised that only a specific group (the authors of the paper and specified individuals) would be able to access the data and written responses that the respondents provided. This was done to ensure the privacy of the respondents, because it would be difficult to guarantee complete anonymity for such written responses. Possible names of organizations and specific technologies mentioned by the respondents in the incident descriptions have also been removed from the article and its direct quotations to ensure the privacy of the respondents.

Source database ID

WoS ID
WOS:001433614700001
Scopus ID
2-s2.0-85218353198